Ti Al N ∕ Ti Al O N ∕ Si 3 N 4 tandem absorber for high temperature solar selective applications

C. Barshilia, Harish; Selvakumar, N.; Rajam, K.S.; Sridhara Rao, D.V.; Muraleedharan, K.; Biswas, A.

doi:10.1063/1.2387897

Public

Ti Al N ∕ Ti Al O N ∕ Si 3 N 4 tandem absorber for high temperature solar selective applications

Published in Applied Physics Letters • Nov 6, 2006

Authors:

Harish C. Barshilia

N. Selvakumar

K.S. Rajam

Abstract

A tandem absorber of TiAlN∕TiAlON∕Si3N4 is prepared using a magnetron sputtering process. The graded composition of the individual component layers of the tandem absorber produces a film with a refractive index increasing from the surface to the substrate, which exhibits a high absorptance (0.95) an...

Subject

Tandem

Materials science

Absorptance

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