Low Temperature Surface Cleaning of Silicon and Its Application to Silicon MBE

Ishizaka, Akitoshi; Shiraki, Y.

doi:10.1149/1.2108651

Public

Low Temperature Surface Cleaning of Silicon and Its Application to Silicon MBE

Published in Journal of The Electrochemical Society • Apr 1, 1986

Authors:

Akitoshi Ishizaka

Y. Shiraki

Abstract

A low temperature thermal cleaning method for Si molecular beam epitaxy (MBE) is proposed. This method consists of wet chemical treatment to eliminate carbon contaminants on Si substrates, thin oxide film formation to protect the clean Si surface from contamination during processing before MBE growt...

Subject

Auger electron spectroscopy

X-ray photoelectron spectroscopy

Silicon

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