Structural and mechanical properties of chromium nitride, molybdenum nitride, and tungsten nitride thin films

Cr–N, Mo–N, and W–N thin films are deposited on silicon by rf reactive magnetron sputtering. The crystallographic phase and residual stress are determined by x-ray diffraction analysis. In each of the three material systems, a hexagonal and a face-centred cubic (fcc) phase are observed. Plasma diagn... View More