rf-plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications

The deposition of amorphous hydrogenated hard carbon (a–C:H) thin films from benzene vapor in a rf plasma is described. a–C:H was deposited on glass, quartz, Si, Ge, and GaAs. Negative self-bias VB and gas pressure P are shown to be the two significant parameters for an accurate control of the depos... View More