Implementation of templated DSA for via layer patterning at the 7nm node

Gronheid, Roel; Doise, Jan; Bekaert, Joost; Teik Chan, Boon; Karageorgos, Ioannis; Ryckaert, Julien; Vandenberghe, Geert; Cao, Yi; Lin, Guanyang; Somervell, Mark; Fenger, Germain; Fuchimoto, Daisuke

doi:10.1117/12.2086090

Public

Implementation of templated DSA for via layer patterning at the 7nm node

Published in Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE • Mar 19, 2015

Authors:

Roel Gronheid

Jan Doise

Joost Bekaert

Abstract

In recent years major advancements have been made in the directed self-assembly (DSA) of block copolymers (BCP). Insertion of DSA for IC fabrication is seriously considered for the 7nm node. At this node the DSA technology could alleviate costs for double patterning and limit the number of masks tha...

Subject

Node (physics)

Computer science

Multiple patterning

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