Application Of Sic-X-Ray Masks For Fabricating Sub-Micron Devices

Mackens, U.; Luethje, H.; Mackens, U.; Mund, F.; Pongratz, S.

doi:10.1117/12.945627

Public

Application Of Sic-X-Ray Masks For Fabricating Sub-Micron Devices

Published in Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE • Jun 14, 1988

Authors:

U. Mackens

H. Luethje

U. Mackens

Abstract

SiC-Au-stepper masks have been used for the fabrication of sub-micron devices by SOR based X-ray lithography in connection with a high precision alignment. As a test device we chosed a sub-micron transistor with four lithographic layers. The gatelength and the gate-width is scaled down from 2.0 pa t...

Subject

Materials science

Optoelectronics

Silicon carbide

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