Leakage optimization of ultra-shallow junctions formed by solid phase epitaxial regrowth

Lindsay, Richard; Henson, K.; Vandervorst, W.; Maex, Karen; J. Pawlak, B.; Duffy, Ray; Surdeanu, R.; Stolk, P.A.; A. Kittl, J.; Giangrandi, Simone; Llimona i Pagès, Xavier; van der Jeugd, K.

doi:10.1116/1.1638774

Public

Leakage optimization of ultra-shallow junctions formed by solid phase epitaxial regrowth

Published in Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena • Jan 1, 2004

Authors:

Richard Lindsay

K. Henson

W. Vandervorst

Abstract

Ultra-shallow p+ junctions formed by solid phase epitaxial regrowth (SPER) have promise for sub-65 nm CMOS technologies. Due to above-equilibrium solid solubilities and minimal diffusion, such junctions can far outperform spike-annealed junctions in terms of resistance, abruptness, and depth. Howeve...

Subject

Leakage (economics)

Materials science

Annealing (glass)

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