&lt;title&gt;Initial results from the EUV engineering test stand&lt;/title&gt;

A. Tichenor, Daniel; K. Ray-Chaudhuri, Avijit; Hun Lee, Sang; N. Chapman, Henry; C. Replogle, William; W. Berger, Kurt; H. Stulen, R.; D. Kubiak, Glenn; E. Klebanoff, Leonard; B. Wronosky, John; J. O’Connell, Donna; H. Leung, Alvin; J. Jefferson, Karen; P. Ballard, W.; C. Hale, Layton; L. Blaedel, Kenneth; S. Taylor, John; A. Folta, James; Spiller, Eberhard; Soufli, Régina; E. Sommargren, Gary; W. Sweeney, Donald; Naulleau, Patrick; A. Goldberg, Kenneth; M. Gullikson, Eric; Bokor, Jeffrey; Attwood, David; Mickan, Uwe; M. Hanzen, Ralph; M. Panning, Eric; Yan, Pei-yang; E. Bjorkholm, J.; W. Gwyn, C.

doi:10.1117/12.450953

Public

<title>Initial results from the EUV engineering test stand</title>

Published in Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE • Dec 20, 2001

Authors:

Daniel A. Tichenor

Avijit K. Ray-Chaudhuri

Sang Hun Lee

Abstract

The Engineering Test Stand (ETS) is an EUV lithography tool designed to demonstrate full-field EUV imaging and provide data required to accelerate production-tool development. Early lithographic results and progress on continuing functional upgrades are presented and discussed. In the ETS a source o...

Subject

Extreme ultraviolet lithography

Optics

Reticle

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