Atomic Layer Deposition of Gd-Doped HfO[sub 2] Thin Films

Adelmann, Christoph; Tielens, Hilde; Dewulf, Daan; Hardy, An; Pierreux, Dieter; Swerts, Johan; Rosseel, Erik; Shi, Xiaodong; K. Van Bael, Marlies; A. Kittl, J.; Van Elshocht, Sven

doi:10.1149/1.3301663

Public

Atomic Layer Deposition of Gd-Doped HfO[sub 2] Thin Films

Published in Journal of The Electrochemical Society • Jan 1, 2010

Authors:

Christoph Adelmann

Hilde Tielens

Daan Dewulf

Abstract

Gd x Hf 1 − x O y thin films were deposited by atomic layer deposition (ALD) using tris(isopropyl-cyclopentadienyl) gadolinium [ Gd ( P i rCp ) 3 ] and HfCl 4 in combination with H 2 O as an oxidizer. Growth curves showed a nearly ideal ALD behavior. The growth per individual Gd ( P i rCp ) 3 / H 2 ...

Subject

Tetragonal crystal system

Atomic layer deposition

Materials science

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