Angle-Resolved Nanosphere Lithography:  Manipulation of Nanoparticle Size, Shape, and Interparticle Spacing

L. Haynes, Christy; D. McFarland, Adam; T. Smith, Matthew; C. Hulteen, John; P. Van Duyne, Richard

doi:10.1021/jp013570+

Public

Angle-Resolved Nanosphere Lithography: Manipulation of Nanoparticle Size, Shape, and Interparticle Spacing

Published in The Journal of Physical Chemistry B • Jan 31, 2002

Authors:

Christy L. Haynes

Adam D. McFarland

Matthew T. Smith

Abstract

This work presents a novel approach to fine-tuning the size, shape, and interparticle spacing of nanoparticles fabricated by nanosphere lithography (NSL). This approach, termed angle-resolved nanosphere lithography (AR NSL), is a variant of NSL that yields vastly different, and increasingly flexible...

Subject

Nanosphere lithography

Materials science

Nanoparticle

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