EUVL system: moving towards production

Meiling, H.; Buzing, Nico; D. Cummings, K.; Harned, Noreen; Hultermans, Bas; de Jonge, Roel; Kessels, Bart; Kürz, Peter; Lok, Sjoerd; Lowisch, Martin; Mallman, Joerg; Pierson, Bill; Wagner, Christian; van Dijk, Andre; van Setten, Eelco; Zimmerman, John

doi:10.1117/12.814041

Public

EUVL system: moving towards production

Published in Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE • Mar 13, 2009

Authors:

H. Meiling

Nico Buzing

K. D. Cummings

Abstract

Single exposure lithography is the most cost effective means of achieving critical level exposures, and extreme ultraviolet lithography (EUVL) is the technology that will enable this for 27nm production and below. ASML is actively engaged in the development of a multi generation production EUVL syst...

Subject

Extreme ultraviolet lithography

Reticle

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