In-Line Electrical Metrology for High-K Gate Dielectrics Deposited by Atomic Layer CVD

The use of an in-line electrical metrology tool for evaluation and characterization of high-k dielectrics has been investigated. The equivalent oxide thickness obtained from the KLA-Tencor Quantox agrees well with high-frequency capacitance-voltage (C-V) results. The ACTIV Jg index parameter shows g... View More