A fully automated hot-wall multiplasma-monochamber reactor for thin film deposition

Roca I Cabarrocas, Pere; Chevrier, J.B.; Huc, J.; Lloret, Ana; Y. Parey, J.; Schmitt, Johannes

doi:10.1116/1.577318

Public

A fully automated hot-wall multiplasma-monochamber reactor for thin film deposition

Published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films • Jul 1, 1991

Authors:

Pere Roca I Cabarrocas

J.B. Chevrier

J. Huc

Abstract

We present a study on the development and the evaluation of a fully automated radio-frequency glow discharge system devoted to the deposition of amorphous thin film semiconductors and insulators. The following aspects were carefully addressed in the design of the reactor: (1) cross contamination by ...

Subject

Substrate (aquarium)

Materials science

Deposition (geology)

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