Physical processes in EUV sources for microlithography

Banine, Vadim; N. Koshelev, K.; H. P. M. Swinkels, G.

doi:10.1088/0022-3727/44/25/253001

Public

Physical processes in EUV sources for microlithography

Published in Journal of Physics D Applied Physics • Jun 8, 2011

Authors:

Vadim Banine

K. N. Koshelev

G. H. P. M. Swinkels

Abstract

The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a source, as well as the EUVL tool, has to fulfil very high demands both technical and cost oriented. The EUVL tool operates at a wavelength of 13.5 nm, which requires the following new developments. The light pro...

Subject

Extreme ultraviolet lithography

Extreme ultraviolet

Lithography

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