Plasma sources for EUV lithography exposure tools

Banine, Vadim; Moors, Roel

doi:10.1088/0022-3727/37/23/001

Public

Plasma sources for EUV lithography exposure tools

Published in Journal of Physics D Applied Physics • Nov 20, 2004

Authors:

Vadim Banine

Roel Moors

Abstract

The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a source, as well as the EUVL tool, has to fulfil extremely high demands both technical and cost oriented. The EUVL tool operates at a wavelength in the range 13–14 nm, which requires a major re-thinking of state-...

Subject

Extreme ultraviolet lithography

Lithography

Plasma

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