Ferroelectricity and Antiferroelectricity of Doped Thin HfO<sub>2</sub>‐Based Films

Hyuk Park, Min; Hwan Lee, Young; Kim, Han‐Joon; Jin Kim, Yu; Moon, Taehwan; Do Kim, Keum; Müller, Johannes; Kersch, Alfred; Schroeder, Uwe; Mikolajick, Thomas; Seong Hwang, Cheol

doi:10.1002/adma.201404531

Public

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2‐Based Films

Published in Advanced Materials • Feb 11, 2015

Authors:

Min Hyuk Park

Young Hwan Lee

Han‐Joon Kim

Abstract

The recent progress in ferroelectricity and antiferroelectricity in HfO2-based thin films is reported. Most ferroelectric thin film research focuses on perovskite structure materials, such as Pb(Zr,Ti)O3, BaTiO3, and SrBi2Ta2O9, which are considered to be feasible candidate materials for non-volatil...

Subject

Materials science

Ferroelectricity

Thin film

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