NXE pellicle: offering a EUV pellicle solution to the industry

Brouns, Derk; Bendiksen, Aage; Broman, Pär; Casimiri, Eric; Colsters, Paul; DelMastro, Peter; de Graaf, Dennis; Janssen, Paul; van de Kerkhof, Mark; Kramer, R.P.; Kruizinga, Matthias; Kuntzel, Henk; van der Meulen, Frits; Ockwell, David; Péter, Mária; Smith, Daniel; Verbrugge, Beatrijs; van de Weg, David; Wiley, Jim; Wojewoda, Noelie; Zoldesi, Carmen; van Zwol, Pieter

doi:10.1117/12.2221909

Public

NXE pellicle: offering a EUV pellicle solution to the industry

Published in Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE • Mar 18, 2016

Authors:

Derk Brouns

Aage Bendiksen

Pär Broman

Abstract

Towards the end of 2014, ASML committed to provide a EUV pellicle solution to the industry. Last year, during SPIE Microlithography 2015, we introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. This paper sho...

Subject

Extreme ultraviolet lithography

Scanner

Computer science

Finding related papers...

Discussions

(0)

No comments yet

Be the first to share your thoughts!