Relationships among growth mechanism, structure and morphology of PEALD TiO
                    <sub>2</sub>
                    films: the influence of O
                    <sub>2</sub>
                    plasma power, precursor chemistry and plasma exposure mode

Chiappim, W; E Testoni, G; C O C Doria, A; S Pessoa, R; A Fraga, M; K A M Galvão, N; G Grigorov, K; Vieira, L; S Maciel, H

doi:10.1088/0957-4484/27/30/305701

Public

Relationships among growth mechanism, structure and morphology of PEALD TiO 2 films: the influence of O 2 plasma power, precursor chemistry and plasma exposure mode

Shared by NobleBlocks on Jun 15, 2016 • 12:00 AM UTC

Authors:

W Chiappim

G E Testoni

A C O C Doria

Abstract

Abstract Titanium dioxide (TiO 2 ) thin films have generated considerable interest over recent years, because they are functional materials suitable for a wide range of applications. The efficient use of the outstanding functional properties of these films relies strongly on their basic characterist...

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