Relationships among growth mechanism, structure and morphology of PEALD TiO<sub>2</sub>films: the influence of O<sub>2</sub>plasma power, precursor chemistry and plasma exposure mode

Chiappim, William; E. Testoni, G.; Cristina Osorio César Dória, Anelise; Sávio Pessoa, Rodrigo; Amorim Fraga, Mariana; Karinni de Almeida Maribondo Galvão, Nierlly; G. Grigorov, K.; Vieira, Lúcia; Santiago Maciel, Homero

doi:10.1088/0957-4484/27/30/305701

Public

Relationships among growth mechanism, structure and morphology of PEALD TiO2films: the influence of O2plasma power, precursor chemistry and plasma exposure mode

Published in Nanotechnology • Jun 15, 2016

Authors:

William Chiappim

G. E. Testoni

Anelise Cristina Osorio César Dória

Abstract

Titanium dioxide (TiO2) thin films have generated considerable interest over recent years, because they are functional materials suitable for a wide range of applications. The efficient use of the outstanding functional properties of these films relies strongly on their basic characteristics, such a...

Subject

Materials science

Crystallinity

Atomic layer deposition

Finding related papers...

Discussions

(0)

No comments yet

Be the first to share your thoughts!