Reassessment of the influence of carrier gases He and Ar on signal intensities in 193 nm excimer LA-ICP-MS analysis

Luo, Tao; Hu, Zhaochu; Zhang, Wen; Günther, Detlef; Liu, Yongsheng; Zong, Keqing; Hu, Shenghong

doi:10.1039/c8ja00163d

Public

Reassessment of the influence of carrier gases He and Ar on signal intensities in 193 nm excimer LA-ICP-MS analysis

Published in Journal of Analytical Atomic Spectrometry • Jan 1, 2018

Authors:

Tao Luo

Zhaochu Hu

Wen Zhang

Abstract

Similar signal intensities can be obtained using Ar instead of He as the carrier gas under high-velocity of the carrier gas on the ablation site or wet plasma conditions in 193 nm ArF excimer LA-ICP-MS analysis.

Subject

Analytical Chemistry (journal)

Excimer

Chemistry

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