Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates

Soethoudt, Job; Grillo, Fabio; A. Marques, Esteban; Ruud van Ommen, J.; Tomczak, Yoann; Nyns, Laura; Van Elshocht, Sven; Delabie, Annelies

doi:10.1002/admi.201800870

Public

Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates

Published in Advanced Materials Interfaces • Oct 17, 2018

Authors:

Job Soethoudt

Fabio Grillo

Esteban A. Marques

Abstract

Abstract Understanding the growth mechanisms during the early stages of atomic layer deposition (ALD) is of interest for several applications including thin film deposition, catalysis, and area‐selective deposition. The surface dependence and growth mechanism of (ethylbenzyl)(1‐ethyl‐1,4‐cyclohexadi...

Subject

Nanoparticle

Atomic layer deposition

Materials science

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