Enhancement of photocatalytic-based processes by mono- and bimetallic (CuPd) rutile loaded nanoparticles for antibiotic resistance genes and facultative pathogenic bacteria removal

Gmurek, Marta; Alexander, Johannes; Mazierski, Paweł; Miodyńska, Magdalena; Fronczak, Maciej; Klimczuk, Tomasz; Zaleska‐Medynska, Adriana; Horn, Harald; Schwartz, Thomas

doi:10.1016/j.cej.2023.142243

Public

Enhancement of photocatalytic-based processes by mono- and bimetallic (CuPd) rutile loaded nanoparticles for antibiotic resistance genes and facultative pathogenic bacteria removal

Published in Chemical Engineering Journal • Mar 4, 2023

Authors:

Marta Gmurek

Johannes Alexander

Paweł Mazierski

Abstract

The aim of the study was the strong reduction of facultative pathogenic bacteria (FPB), and clinically relevant antibiotic resistance genes (ARGs) from secondary effluent. To evaluate the ARGs removal efficiency comparative study of individual unit processes and combined AOPs has been performed. The...

Subject

Photocatalysis

Bimetallic strip

Chemistry

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