Future of plasma etching for microelectronics: Challenges and opportunities

S. Oehrlein, Gottlieb; M. Brandstadter, Stephan; L. Bruce, Robert; P. Chang, Jane; C. DeMott, Jessica; M. Donnelly, Vincent; Dussart, Rémi; Fischer, Andreas; A. Gottscho, Richard; Hamaguchi, Satoshi; Honda, Masanobu; Hori, Masaru; Ishikawa, Kenji; G. Jaloviar, Steven; J. Kanarik, Keren; Karahashi, Kazuhiro; Ko, Akiteru; Kothari, Hiten; Kuboi, Nobuyuki; J. Kushner, Mark; Lill, Thorsten; Luan, Pingshan; Mesbah, Ali; Miller, Eric; Nath, Shoubhanik; Ohya, Yoshinobu; Omura, Mitsuhiro; Park, Chanhoon; Poulose, John; Rauf, Shahid; Sekine, Makoto; G. Smith, Taylor; Stafford, Nathan; Standaert, Theo; L. G. Ventzek, Peter

doi:10.1116/6.0003579

Public

Future of plasma etching for microelectronics: Challenges and opportunities

Shared by NobleBlocks on Jun 7, 2024 • 12:00 AM UTC

Authors:

Gottlieb S. Oehrlein

Stephan M. Brandstadter

Robert L. Bruce

Abstract

Plasma etching is an essential semiconductor manufacturing technology required to enable the current microelectronics industry. Along with lithographic patterning, thin-film formation methods, and others, plasma etching has dynamically evolved to meet the exponentially growing demands of the microel...

Discussions